Duration
25h Th, 15h Pr
Number of credits
Lecturer
Coordinator
Language(s) of instruction
English language
Organisation and examination
Teaching in the second semester
Schedule
Units courses prerequisite and corequisite
Prerequisite or corequisite units are presented within each program
Learning unit contents
This course is an introduction to the principles and techniques of nanofabrication. It consists of two parts, detailed as follows:
PART I - Nanolithography
1. Photolithography
2. Electron beam lithography
3. Focused ion beam - dual beam
4. Other techniques
PART II - Material synthesis at the nanoscale
1. Surface adsorption and growth mechanisms
2. Physical vapour deposition
3. Chemical vapour deposition
4. Etching processes
Learning outcomes of the learning unit
As result of this teaching, students will acquire the following competences and skills:
* To integrate processes of micro- and nanoscale device fabrication in view of realizing particular devices,
* To make use of nanofabrication design tools,
* To perform micro- and nanofabrication process steps in a clean room environment,
* To characterize the micro- and nanosystems at the different steps using the tools available at the NanoFab platform of ULiège.
Prerequisite knowledge and skills
Basic concepts in solid-state materials physics and/or chemistry are necessary. Bachelor-degree experience in laboratory works is necessary. A noticeable inclination for cooking at home is an asset.
Planned learning activities and teaching methods
Theoretical concepts related to the processes involved in nanofabrication will be exposed during oral lectures following the table of contents described above. Practical laboratory work will be performed as direct applications to these concepts and will be organized following the scheme described below,
Lab-1 (2h): SEM visualization
Lab-2 (2h): ELPHY/KLayout/Ledit Pattern generator
Lab-3 (3h): Spin coating + backing + dose test + development + analysis
Lab-4 (2h): Material synthesis by rf magnetron sputtering
Lab-5 (2h): Metallization by electron beam evaporation and lift-off
Lab-6 (4h): Characterization and analysis (surface morphology, device topography, electrical transport and magnetic properties)
The acquired competencies and skills will be applied to the design and fabrication of a particular device. This project will be performed in groups with the support of bibliographical resources and with the assistance of the tutors.
Mode of delivery (face-to-face ; distance-learning)
Lectures on theoretical concepts will be given by the tutors face-to-face. Practical works will be performed by the students in the laboratories with the guidance of lab assistants and tutors.
Recommended or required readings
List of useful references :
* Nanofabrication - Techniques and Principles, M. Stepanova and S. Dew, Editors, Springer 2012 (ISBN 978-3-7091-0423-1 e-ISBN 978-3-7091-0424-8 DOI 10.1007/978-3-7091-0424-8)
* The Materials Science of Thin Films, M. Ohring, Academic Press 1992, ISBN0-12-524990-X
Assessment methods and criteria
The evaluation will consist, on one hand, of a final report of three pages, which follows the style of a scientific publication, taking into account the assessment by lab assistnats and teachers regarding the work of the students over the semester, and, on the other hand, of an oral presentation of the lab project.
Work placement(s)
None.
Organizational remarks
Course material and resources are available on eCampus.
Contacts
Tutors:
Prof. A. V. Silhanek (asilhanek@uliege.be)
Prof. N. D. Nguyen (ngocduy.nguyen@uliege.be)
Adaptation of teaching commitments following the COVID-19 pandemic for the May-June 2020 session
Teaching methods implemented : distance-learning
The course material remains available on the ecampus platform (see above). Teachers can be contacted for all questions.
Assessment subjects
The evaluation consists in an individual assignment. Each student is appointed a topic on which he/she will have to do some research, to prepare and deliver a written report, and to defend it at the exam in June. These topics cover the following content of the lectures :
Electron-matter interaction
Focused ion beam
Two-photon lithography and nanoimprint lithography
NEMS and MEMS
Soft lithography
Radio-frequency magnetron sputtering of ZnO
Epitaxial growth of Si on Si by chemical vapor deposition
Atomic layer deposition of alumina
Assessment methods
The tasks that we expect from the student for the individual assignement are : - To perform a bibliographic research on the topic, - To write a 5-page report (Arial 11 pts or Times NR 10 pts for the main text), aiming for a pedagogical approach, to be delivered early June (*), - To deliver a comprehensive presentation of 15 minutes at the date and time that will be defined for the exam of the course (yet to be determined) (**). (*) The actual date will depend on the date of the exam. The report is due about one week before the exam. (**) Assuming that remote teaching will probably be followed by remote evaluation, each student is asked to prepare for a remote presentation. The presentation will be followed by a Q/R session (15 minutes).
Contacts
See above.
Adaptation of teaching commitments following the COVID-19 pandemic for the Aug-Sept 2020 session
Assessment subjects
No exam will be organized for this course in August / September 2020, as all registered students have earned the credits associated to this teaching.
Assessment methods
No exam will be organized for this course in August / September 2020, as all registered students have earned the credits associated to this teaching.
Contacts
No exam will be organized for this course in August / September 2020, as all registered students have earned the credits associated to this teaching.